Synthesis and characterization of Cr2O3:Al thin films by plasma of R.F. magnetron sputtering for gas sensing application

Abstract

As a gas sensor for nitric oxide, thin films of Cr2O3:Al nanostructures have been created using the radio frequency (RF) magnetron sputtering process at various aluminum weight percentages (0, 2, 4, and 6). (NO2). X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), UV-Visible characteristics, and sensing properties were also examined as part of the characterization. The structural analysis revealed that the films had multiple crystal phases, including a hexagonal phase. According to the results of the sensing properties, the best sample was 4% Al, which had a sensitivity of 32% at 200 oC and response times of less than 15 s and 77 s for recovery.